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High-k gate dielectrics
6
"Comparative analysis of MIS capacitance structures with high-k dielectrics under gamma, 16O and p Radiation" (2012) Quinteros, C.P.;Salomone, L.S.;Redin, E. (...)Campabadal, F. IEEE Transactions on Nuclear Science. 59(4 PART 1):767-772
"Comparative analysis of MIS capacitance structures with high-k dielectrics under gamma, 16O and p Radiation" (2012) Quinteros, C.P.;Salomone, L.S.;Redin, E. (...)Campabadal, F. IEEE Transactions on Nuclear Science. 59(4 PART 1):767-772
"Charge trapping/detrapping in HfO2-based MOS devices" (2011) Salomone, L.S.;Carbonetto, S.H.;Inza, M.A.G. (...)Faigón, A. 2011 Argentine School of Micro-Nanoelectronics, Technology and Applications, EAMTA 2011:113-117
"Charge trapping/detrapping in HfO2-based MOS devices" (2011) Salomone, L.S.;Carbonetto, S.H.;Inza, M.A.G. (...)Faigón, A. 2011 Argentine School of Micro-Nanoelectronics, Technology and Applications, EAMTA 2011:113-117
"Comparative analysis of MIS capacitive structures with high-K dielectrics under gamma, 16O and p radiation" (2011) Quinteros, C.;Sambuco Salomone, L.;Redín, E. (...)Campabadal, F. 12th European Conference on Radiation and Its Effects on Component and Systems, RADECS 2011:67-72
"Comparative analysis of MIS capacitive structures with high-K dielectrics under gamma, 16O and p radiation" (2011) Quinteros, C.;Sambuco Salomone, L.;Redín, E. (...)Campabadal, F. 12th European Conference on Radiation and Its Effects on Component and Systems, RADECS 2011:67-72