"Interferometric lithography at 46.9 nm" (2004) Capeluto, M.G.;Vaschenko, G.;Grisham, M.E. (...)Paz J.L. RIAO/OPTILAS 2004: 5th Iberoamerican Meeting on Optics, and 8th Latin American Meeting on Optics, Lasers, and their Applications; ICO Regional Meeting. 5622(PART 2):735-738

"Interferometric lithography at 46.9 nm" (2004) Capeluto, M.G.;Vaschenko, G.;Grisham, M.E. (...)Paz J.L. RIAO/OPTILAS 2004: 5th Iberoamerican Meeting on Optics, and 8th Latin American Meeting on Optics, Lasers, and their Applications; ICO Regional Meeting. 5622(PART 2):735-738