Conferencia

Inza, M.G.; Lipovetzky, J.; Redin, E.; Carbonetto, S.; Faigon, A. "Stand alone MOS dosimetry system for high dose ionizing radiation" (2009) Argentine School of Micro-Nanoelectronics, Technology and Applications 2009, EAMTA 2009:27-30
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Abstract:

A Metal Oxide Semiconductor (MOS) dosimetry system prototype for measurement of high dose ionizing radiation is presented. The hardware design target is to implement the Bias Controlled Cycled Measurement (BCCM) novel technique. An 8 bit microcontroller is used to control the measurement and the biasing of 4 independent MOS sensors, to interface an RS232 port for PC communications and to handle a Human Machine Interface (HMI) for basic operation. Measurement results are presented.

Registro:

Documento: Conferencia
Título:Stand alone MOS dosimetry system for high dose ionizing radiation
Autor:Inza, M.G.; Lipovetzky, J.; Redin, E.; Carbonetto, S.; Faigon, A.
Ciudad:Bariloche
Filiación:Device Physics Laboratory-Microelectronics, Departamento de Fisica, Universidad de Buenos Aires, Av. Paseo Colon 850, Buenos Aires, C1063ACV, Argentina
Palabras clave:8-bit microcontrollers; Basic operation; Hardware design; High dose; Human machine interface; Measurement results; Metal oxide semiconductor; MOS sensors; Novel techniques; Stand -alone; System prototype; Dosimeters; Ionizing radiation; Metallic compounds; MOS devices; Nanoelectronics; Radiation shielding; Radioactivity; Dosimetry
Año:2009
Página de inicio:27
Página de fin:30
DOI: http://dx.doi.org/10.1109/EAMTA.2009.5288903
Título revista:Argentine School of Micro-Nanoelectronics, Technology and Applications 2009, EAMTA 2009
Título revista abreviado:Proc. Argent. Sch. Micro-Nanoelectronics, Technol. Appl., EAMTA
Registro:https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_97814244_v_n_p27_Inza

Referencias:

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  • Holmes-Siedle, A., Adams, L., RADFETs: A Review of the Use of Metal-Oxide-Silicon Devices as Integrating Dosimeters Radiation Physics and Chemistry, 28 (2), pp. 235-244
  • Faigon, A., Lipovetzky, J., Redin, E., Krusczenski, G., Extension of the Measurement Range of MOS Dosimeters Using Radiation Induced Charge Neutralization (2008) IEEE Trans Nucl Sci, 55 (4), pp. 2141-2147
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  • Sze, S., Physics of Semiconductor devices, 3rd edition, , Willey, ISBN: 978-0-471-14323-9
  • Kelleher, A., McDonnell, N., O'Neill, B., Lane, W., Adams, L., Investigation into the re-use of PMOS dosimeters (1994) IEEE Trans.son Nuc. Sci, 41, pp. 445-451. , 3, 2, pp
  • Boesch, H., McGarrity, J., McLean, F., Temperature-and Field-Dependent Charge Relaxation in SiO2 Gate Insulators (1978) IEEE Trans, on Nucl. Sci, 25 (3), pp. 1012-1016
  • Lipovetzky, J., Garcia Inza, M., Carbonetto, S., Redin, E., Faigon, A., Temperature and interface traps compensation in MOS Bias Controlled Cycled Dosimeters (2008) Proc. of the third Argentine School of Micro-Nanoelectronics, Technology and Applications (EAMTA 2008), pp. 23-28A4 - IEEE; CAS; UCC; INTI; INVAP

Citas:

---------- APA ----------
Inza, M.G., Lipovetzky, J., Redin, E., Carbonetto, S. & Faigon, A. (2009) . Stand alone MOS dosimetry system for high dose ionizing radiation. Argentine School of Micro-Nanoelectronics, Technology and Applications 2009, EAMTA 2009, 27-30.
http://dx.doi.org/10.1109/EAMTA.2009.5288903
---------- CHICAGO ----------
Inza, M.G., Lipovetzky, J., Redin, E., Carbonetto, S., Faigon, A. "Stand alone MOS dosimetry system for high dose ionizing radiation" . Argentine School of Micro-Nanoelectronics, Technology and Applications 2009, EAMTA 2009 (2009) : 27-30.
http://dx.doi.org/10.1109/EAMTA.2009.5288903
---------- MLA ----------
Inza, M.G., Lipovetzky, J., Redin, E., Carbonetto, S., Faigon, A. "Stand alone MOS dosimetry system for high dose ionizing radiation" . Argentine School of Micro-Nanoelectronics, Technology and Applications 2009, EAMTA 2009, 2009, pp. 27-30.
http://dx.doi.org/10.1109/EAMTA.2009.5288903
---------- VANCOUVER ----------
Inza, M.G., Lipovetzky, J., Redin, E., Carbonetto, S., Faigon, A. Stand alone MOS dosimetry system for high dose ionizing radiation. Proc. Argent. Sch. Micro-Nanoelectronics, Technol. Appl., EAMTA. 2009:27-30.
http://dx.doi.org/10.1109/EAMTA.2009.5288903