Abstract:
Arrays of nano-dots were demonstrated by multiple exposure interferometric lithography using a table top λ=46.9 nm wavelength laser. Patterns of different geometries with features ~ 60 nm FWHM were printed controlling the exposure dose. © 2007 Optical Society of America.
Registro:
Documento: |
Conferencia
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Título: | Arrays of sub-100 nm features fabricated with table top extreme ultraviolet interferometric laser lithography |
Autor: | Wachulak, P.W.; Capeluto, M.G.; Marconi, M.C.; Menoni, C.S.; Rocca, J.J. |
Ciudad: | Baltimore, MD |
Filiación: | NSF ERC for Extreme Ultraviolet Science and Technology, Department of Electrical and Computer Engineering, Colorado State University, United States Department o de Fisica, Facultad de Ciencias Exactas, Universidad de Buenos iares, Argentina
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Palabras clave: | Different geometry; Exposure dose; Extreme Ultraviolet; Interferometric lithography; Laser lithography; Multiple exposure; Sub-100 nm; Wavelength lasers; Interferometry |
Año: | 2007
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Título revista: | Conference on Lasers and Electro-Optics, CLEO 2007
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Título revista abreviado: | Opt.InfoBase Conf. Papers
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ISSN: | 21622701
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Registro: | https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_21622701_v_n_p_Wachulak |
Referencias:
- Fernandez, A., Decker, J.Y., Herman, S.M., Philion, D.W., Sweeney, D.W., Perry, M.D., Methods for fabricating arrays of holes using interference lithography (1997) Journal of Vacuum Science and Technology B, 15, pp. 2439-2443
- Solak, H.H., Nanolithography with coherent extreme ultraviolet light (2006) Journal of Physics D, 39, pp. R171-R188
- Solak, H.H., David, C., Gobrecht, J., Golovkina, V., Cerrina, F., Kim, S.O., Nealey, F.P., Sub-50 nm period patterns with EUV interference lithography (2003) Microelectronic Engineering, 67, pp. 56-62
- Solak, H.H., He, D., Li, W., Singh-Gasson, S., Cerrina, F., Sohn, B.H., Yang, X.M., Nealey, P., Exposure of 38 nm period grating patterns with extreme ultraviolet interferometric lithography (1999) Applied Physics Letters, 75, pp. 2328-2330
- Macchietto, C.D., Benware, B.R., Rocca, J.J., Generation of millijoule level soft X-ray laser pulses at 4 Hz repetition rate in a highly saturated table top capillary discharge amplifier (1999) Optics Letters, 24, pp. 1115-1117A4 -
Citas:
---------- APA ----------
Wachulak, P.W., Capeluto, M.G., Marconi, M.C., Menoni, C.S. & Rocca, J.J.
(2007)
. Arrays of sub-100 nm features fabricated with table top extreme ultraviolet interferometric laser lithography. Conference on Lasers and Electro-Optics, CLEO 2007.
Recuperado de https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_21622701_v_n_p_Wachulak [ ]
---------- CHICAGO ----------
Wachulak, P.W., Capeluto, M.G., Marconi, M.C., Menoni, C.S., Rocca, J.J.
"Arrays of sub-100 nm features fabricated with table top extreme ultraviolet interferometric laser lithography"
. Conference on Lasers and Electro-Optics, CLEO 2007
(2007).
Recuperado de https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_21622701_v_n_p_Wachulak [ ]
---------- MLA ----------
Wachulak, P.W., Capeluto, M.G., Marconi, M.C., Menoni, C.S., Rocca, J.J.
"Arrays of sub-100 nm features fabricated with table top extreme ultraviolet interferometric laser lithography"
. Conference on Lasers and Electro-Optics, CLEO 2007, 2007.
Recuperado de https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_21622701_v_n_p_Wachulak [ ]
---------- VANCOUVER ----------
Wachulak, P.W., Capeluto, M.G., Marconi, M.C., Menoni, C.S., Rocca, J.J. Arrays of sub-100 nm features fabricated with table top extreme ultraviolet interferometric laser lithography. Opt.InfoBase Conf. Papers. 2007.
Available from: https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_21622701_v_n_p_Wachulak [ ]