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Abstract:

The design of a phase-shift interferometer in the extreme ultraviolet (EUV) is described. The interferometer is expected to achieve a significantly higher precision as compared with similar instruments that utilize lasers in the visible range. The interferometer's design is specifically adapted for its utilization with a table top pulsed capillary discharge EUV laser. The numerical model evaluates the errors in the interferograms and in the retrieved wavefront induced by the shot-to-shot fluctuations and pointing instabilities of the laser. © 2014 Optical Society of America.

Registro:

Documento: Artículo
Título:Design of a phase-shifting interferometer in the extreme ultraviolet for high-precision metrology
Autor:Capeluto, M.G.; Marconi, M.C.; Iemmi, C.C.
Filiación:Departamento de Física, Facultad de Ciencias Exactas y Naturales, Universidad de Buenos Aires, Pabellón 1, Ciudad Universitaria, Buenos Aires, Argentina
Instituto de Física de Buenos Aires (IFIBA), CONICET, Universidad de Buenos Aires, Buenos Aires, Argentina
Department of Electrical and Computer Engineering, NSF ERC for Extreme Ultraviolet Science and Technology, Colorado State University, Fort Collins, CO 80523, United States
Palabras clave:Extreme ultraviolet lithography; Interferometers; Phase shift; Extreme Ultraviolet; Extreme ultraviolets; High-precision; Interferograms; Phase-shift interferometer; Phase-shifting interferometers; Pulsed capillary discharges; Visible range; Pulsed lasers
Año:2014
Número:7
Página de inicio:1274
Página de fin:1283
DOI: http://dx.doi.org/10.1364/AO.53.001274
Título revista:Applied Optics
ISSN:1559128X
CODEN:APOPA
Registro:https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_1559128X_v_n7_p1274_Capeluto

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Citas:

---------- APA ----------
Capeluto, M.G., Marconi, M.C. & Iemmi, C.C. (2014) . Design of a phase-shifting interferometer in the extreme ultraviolet for high-precision metrology. Applied Optics(7), 1274-1283.
http://dx.doi.org/10.1364/AO.53.001274
---------- CHICAGO ----------
Capeluto, M.G., Marconi, M.C., Iemmi, C.C. "Design of a phase-shifting interferometer in the extreme ultraviolet for high-precision metrology" . Applied Optics, no. 7 (2014) : 1274-1283.
http://dx.doi.org/10.1364/AO.53.001274
---------- MLA ----------
Capeluto, M.G., Marconi, M.C., Iemmi, C.C. "Design of a phase-shifting interferometer in the extreme ultraviolet for high-precision metrology" . Applied Optics, no. 7, 2014, pp. 1274-1283.
http://dx.doi.org/10.1364/AO.53.001274
---------- VANCOUVER ----------
Capeluto, M.G., Marconi, M.C., Iemmi, C.C. Design of a phase-shifting interferometer in the extreme ultraviolet for high-precision metrology. 2014(7):1274-1283.
http://dx.doi.org/10.1364/AO.53.001274