Artículo
Kleiman, A.; Lamas, D.G.; Craievich, A.F.; Márquez, A. "X-ray reflectivity analysis of titanium dioxide thin films grown by cathodic arc deposition" (2014) Journal of Nanoscience and Nanotechnology. 14(5):3902-3909
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Abstract:
TiO 2 thin films deposited by a vacuum arc on a glass substrate were characterized by X-ray reflectivity (XRR), X-ray diffraction (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM). Several thin films with different amounts of deposited TiO 2 mass and different deposition and annealing temperatures were studied. A qualitative analysis of the XRD patterns indicated the presence of the anatase and/or rutile crystalline phases in most of the studied samples. From the analysis of the experimental XRR curves - which exhibited a wide angular range of oscillatory behavior - the thickness, mass density and interface roughness were determined. All XRR patterns were well fitted by modeled curves that assume the presence of a single and homogeneous TiO 2 layer over which a very thin H 2 O layer is adsorbed. The thickest H 2 O adsorption layers were developed in films with the highest anatase content. Our overall results of the XRR analyses are consistent with those derived from the imaging techniques (SEM and AFM). Copyright © 2014 American Scientific Publishers.
Registro:
| Documento: | Artículo |
| Título: | X-ray reflectivity analysis of titanium dioxide thin films grown by cathodic arc deposition |
| Autor: | Kleiman, A.; Lamas, D.G.; Craievich, A.F.; Márquez, A. |
| Filiación: | Consejo Nacional de Investigaciones Científicas y Técnicas (CONICET), Av. Rivadavia 1917, C1033AAJ Buenos Aires, Argentina Instituto de Física Del Plasma (INFIP), Departamento de Física, Universidad de Buenos Aires, Ciudad Universitaria, Pabellón I, C1428EHA Buenos Aires, Argentina Facultad de Ingeniería, Laboratorio de Caracterización de Materiales, Universidad Nacional Del Comahue, Buenos Aires 1400, Q8300IBX Neuquén, Argentina Instituto de Física, Universidade de São Paulo, Cidade Universitaria, Travessa R da Rua do Matao, No. 187, 05508-900 São Paulo, Brazil |
| Palabras clave: | Cathodic Arc Deposition; Thin Films; X-Ray Reflectivity; Atomic force microscopy; Imaging techniques; Oxide minerals; Scanning electron microscopy; Substrates; Thin films; Titanium dioxide; Vacuum applications; X ray diffraction; Annealing temperatures; Cathodic arc deposition; Oscillatory behaviors; Qualitative analysis; TiO; Titanium dioxide thin film; X ray reflectivity; X-ray reflectivity analysis; Deposition |
| Año: | 2014 |
| Volumen: | 14 |
| Número: | 5 |
| Página de inicio: | 3902 |
| Página de fin: | 3909 |
| DOI: | http://dx.doi.org/10.1166/jnn.2014.8017 |
| Título revista: | Journal of Nanoscience and Nanotechnology |
| Título revista abreviado: | J. Nanosci. Nanotechnol. |
| ISSN: | 15334880 |
| CODEN: | JNNOA |
| Registro: | https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_15334880_v14_n5_p3902_Kleiman |
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Citas:
---------- APA ----------
Kleiman, A., Lamas, D.G., Craievich, A.F. & Márquez, A. (2014) . X-ray reflectivity analysis of titanium dioxide thin films grown by cathodic arc deposition. Journal of Nanoscience and Nanotechnology, 14(5), 3902-3909.http://dx.doi.org/10.1166/jnn.2014.8017
---------- CHICAGO ----------
Kleiman, A., Lamas, D.G., Craievich, A.F., Márquez, A. "X-ray reflectivity analysis of titanium dioxide thin films grown by cathodic arc deposition" . Journal of Nanoscience and Nanotechnology 14, no. 5 (2014) : 3902-3909.http://dx.doi.org/10.1166/jnn.2014.8017
---------- MLA ----------
Kleiman, A., Lamas, D.G., Craievich, A.F., Márquez, A. "X-ray reflectivity analysis of titanium dioxide thin films grown by cathodic arc deposition" . Journal of Nanoscience and Nanotechnology, vol. 14, no. 5, 2014, pp. 3902-3909.http://dx.doi.org/10.1166/jnn.2014.8017
---------- VANCOUVER ----------
Kleiman, A., Lamas, D.G., Craievich, A.F., Márquez, A. X-ray reflectivity analysis of titanium dioxide thin films grown by cathodic arc deposition. J. Nanosci. Nanotechnol. 2014;14(5):3902-3909.http://dx.doi.org/10.1166/jnn.2014.8017
