Abstract:
Arrays of nanodots were directly patterned by interferometric lithography using a bright table-top 46.9 nm laser. Multiple exposures with a Lloyd's mirror interferometer allowed to print arrays of 60 nm FWHM features. This laser-based extreme ultraviolet interferometric technique makes possible to print different nanoscale patterns using a compact tabletop set up. © 2007 Optical Society of America.
Registro:
Documento: |
Artículo
|
Título: | Patterning of nano-scale arrays by table-top extreme ultraviolet laser interferometric lithography |
Autor: | Wachulak, P.W.; Capeluto, M.G.; Marconi, M.C.; Menoni, C.S.; Rocca, J.J. |
Filiación: | NSF ERC for Extreme Ultraviolet Science and Technology, Department of Electrical and Computer Engineering, Colorado State University, United States Departamento de Física, Facuhad de Ciencias Exactas, Universidad de Buenos Aires, Argentina
|
Palabras clave: | Array processing; Interferometers; Lithography; Nanoscale patterns; Tabletop set up; Nanostructured materials |
Año: | 2007
|
Volumen: | 15
|
Número: | 6
|
Página de inicio: | 3465
|
Página de fin: | 3469
|
DOI: |
http://dx.doi.org/10.1364/OE.15.003465 |
Título revista: | Optics Express
|
Título revista abreviado: | Opt. Express
|
ISSN: | 10944087
|
Registro: | https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_10944087_v15_n6_p3465_Wachulak |
Referencias:
- Castano, F.J., Morecroft, D., Jung, W., Ross, C.A., Spin-dependent scattering in multilayered magnetic rings (2005) Phys. Rev. Lett, 95, p. 137201
- Castano, F.J., Ross, C.A., Eilez, A., Jung, W., Frandsen, C., Magnetic configurations in 160-520-nm-diameter ferromagnetic rings (2004) Phys. Rev. B, 69, p. 144421
- Castano, F.J., Ross, C.A., Frandsen, C., Eilez, A., Gil, D., Smith, H.I., Redjdal, M., Humphrey, F.B., Metastable states in magnetic nanorings (2003) Phys. Rev. B, 67, p. 184425
- Chen, Y., Lebib, A., Li, S.P., Natali, M., Peyrade, D., Cambril, E., Nanoimprint fabrication of micro-rings for magnetization reversal studies (2001) Microelectron. Eng, 57 -8, p. 405
- Katine, J.A., Albert, F.J., Buhrman, R.A., Myers, E.B., Ralph, D.C., Current-driven magnetization reversal and spin-wave excitations in Co/Cu/Co pillars (2000) Phys. Rev. Lett, 84, p. 3149
- Lebib, A., Li, S.P., Natali, M., Chen, Y., Size and thickness dependencies of magnetization reversal in Co dot arrays (2001) J. Appl. Phys, 89, p. 3892
- Saitoh, E., Harii, K., Miyajima, H., Yamaoka, T., Okuma, S., Critical phenomena in chiral symmetry breakdown of micromagnetic configurations in a nanostructured ferromagnetic ring (2005) Phys. Rev. B, 71, p. 172406
- Aizpurua, J., Hanarp, P., Sutherland, D.S., Kail, M., Bryant, G.W., de Abajo, F.J.G., Optical properties of gold nanorings (2003) Phys. Rev. Lett, 90, p. 057401
- Xia, Y.N., Rogers, J.A., Paul, K.E., Whitesides, G.M., Unconventional methods for fabricating and patterning nanostructures (1999) Chem. Rev, 99, p. 1823
- Geissler, M., Xia, Y.N., Patterning: Principles and some new developments (2004) Advanced Mater, 16, p. 1249
- Fan, W.J., Zhang, S., Malloy, K.J., Brueck, S.R.J., Large-area, infrared nanophotonic materials fabricated using interferometric lithography (2005) J. Vac. Sci. Technol. B, 23, p. 2700
- Fernandez, A., Decker, Y.J., Herman, S.M., Phillion, D.W., Sweeney, D.W., Perry, M.D., Methods for fabricating arrays of holes using interference lithography (1997) J. Vac. Sci. Technol. B, 15, p. 2439
- Switkes, M., Bloomstein, T.M., Rothschild, M., Patterning of sub-50 nm dense features with spaceinvariant 157 nm interference lithography (2000) Appl. Phys. Lett, 77, p. 3149
- Solak, H.H., Nanolithography with coherent extreme ultraviolet light (2006) J. Phys. D, 39, pp. R171-R188
- Solak, H.H., David, C., Gobrecht, J., Golovkina, V., Cerrina, F., Kim, S.O., Nealey, P.F., Sub-50 nm period patterns with EUV interference lithography (2003) Microelectron. Eng, 67-68, p. 56
- Solak, H.H., He, D., Li, W., Singh-Gasson, S., Cerrina, F., Sohn, B.H., Yang, X.M., Nealey, P., Exposure of 38 nm period grating patterns with extreme ultraviolet interferometric lithography (1999) Appl. Phys. Lett, 75, p. 2328
- Liu, Y., Seminario, M., Tomasel, F.J., Chang, C., Rocca, J.J., Attwood, D.T., Achievement of essentially full spatial coherence in a high-average-power soft-x-ray laser (2001) Phys. Rev. A, 6303, p. 033802
- Liu, Y.W., Seminario, M., Tomasel, F.J., Chang, C., Rocca, J.J., Attwood, D.T., Spatial coherence measurement of a high average power table-top soft X-ray laser (2001) Journal De Physique IV, 11, p. 123
- Junarsa, I., Stoykovich, M.P., Nealey, P.F., Ma, Y.S., Cerrina, F., Hydrogen silsesquioxane as a high resolution negative-tone resist for extreme ultraviolet lithography (2005) J. Vacuum Science Technol. B, 23, p. 138
Citas:
---------- APA ----------
Wachulak, P.W., Capeluto, M.G., Marconi, M.C., Menoni, C.S. & Rocca, J.J.
(2007)
. Patterning of nano-scale arrays by table-top extreme ultraviolet laser interferometric lithography. Optics Express, 15(6), 3465-3469.
http://dx.doi.org/10.1364/OE.15.003465---------- CHICAGO ----------
Wachulak, P.W., Capeluto, M.G., Marconi, M.C., Menoni, C.S., Rocca, J.J.
"Patterning of nano-scale arrays by table-top extreme ultraviolet laser interferometric lithography"
. Optics Express 15, no. 6
(2007) : 3465-3469.
http://dx.doi.org/10.1364/OE.15.003465---------- MLA ----------
Wachulak, P.W., Capeluto, M.G., Marconi, M.C., Menoni, C.S., Rocca, J.J.
"Patterning of nano-scale arrays by table-top extreme ultraviolet laser interferometric lithography"
. Optics Express, vol. 15, no. 6, 2007, pp. 3465-3469.
http://dx.doi.org/10.1364/OE.15.003465---------- VANCOUVER ----------
Wachulak, P.W., Capeluto, M.G., Marconi, M.C., Menoni, C.S., Rocca, J.J. Patterning of nano-scale arrays by table-top extreme ultraviolet laser interferometric lithography. Opt. Express. 2007;15(6):3465-3469.
http://dx.doi.org/10.1364/OE.15.003465