Conferencia

Wachulak, P.W.; Capeluto, M.G.; Patel, D.; Marconi, M.C.; Menoni, C.S.; Rocca, J.J. "Nanopillars and arrays of nanoholes fabricated by extreme ultraviolet interferometric laser lithography" (2007) 20th Annual Meeting of the IEEE Lasers and Electro-Optics Society, LEOS:486-487
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Abstract:

Arrays of holes and pillars were fabricated by multiple exposure interferometric lithography using a table top λ=46.9 nm wavelength laser. Size and the feature characteristic is controlled changing the applied exposure dose. ©2007 IEEE.

Registro:

Documento: Conferencia
Título:Nanopillars and arrays of nanoholes fabricated by extreme ultraviolet interferometric laser lithography
Autor:Wachulak, P.W.; Capeluto, M.G.; Patel, D.; Marconi, M.C.; Menoni, C.S.; Rocca, J.J.
Ciudad:Lake Buena Vista, FL
Filiación:NSF ERC for Extreme Ultraviolet Science and Technology, Department of Electrical and Computer Engineering, Colorado State University
Department o de Fisica, Facultad de Ciencias Exactas, Universidad de Buenos Aires, Argentina
Palabras clave:Annual meetings; Electro-optics; Interferometric lithography; Geodetic satellites; Interferometry; Lasers
Año:2007
Página de inicio:486
Página de fin:487
DOI: http://dx.doi.org/10.1109/LEOS.2007.4382491
Título revista:20th Annual Meeting of the IEEE Lasers and Electro-Optics Society, LEOS
Título revista abreviado:Conf Proc Laser Electr Optic Soc Annu Meet CLEO
ISSN:10928081
CODEN:CPLSE
Registro:https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_10928081_v_n_p486_Wachulak

Referencias:

  • Fernandez, A., Decker, J.Y., Herman, S.M., Philion, D.W., Sweeney, D.W., Perry, M.D., Methods for fabricating arrays of holes using interference lithography (1997) Journal of Vacuum Science and Technology B, 15, pp. 2439-2443
  • Solak, H.H., Nanolithography with coherent extreme ultraviolet light (2006) Journal of Physics D, 39, pp. R171-R188
  • Solak, H.H., David, C., Gobrecht, J., Golovkina, V., Cerrina, F., Kim, S.O., Nealey, F.P., Sub-50 nm period patterns with EUV interference lithography (2003) Microelectronic Engineering, 67 -8, pp. 56-62
  • Macchietto, C.D., Benware, B.R., Rocca, J.J., Generation of millijoule level soft X-ray laser pulses at 4 Hz repetition rate in a highly saturated table top capillary discharge amplifier (1999) Optics Letters, 24, pp. 1115-1117

Citas:

---------- APA ----------
Wachulak, P.W., Capeluto, M.G., Patel, D., Marconi, M.C., Menoni, C.S. & Rocca, J.J. (2007) . Nanopillars and arrays of nanoholes fabricated by extreme ultraviolet interferometric laser lithography. 20th Annual Meeting of the IEEE Lasers and Electro-Optics Society, LEOS, 486-487.
http://dx.doi.org/10.1109/LEOS.2007.4382491
---------- CHICAGO ----------
Wachulak, P.W., Capeluto, M.G., Patel, D., Marconi, M.C., Menoni, C.S., Rocca, J.J. "Nanopillars and arrays of nanoholes fabricated by extreme ultraviolet interferometric laser lithography" . 20th Annual Meeting of the IEEE Lasers and Electro-Optics Society, LEOS (2007) : 486-487.
http://dx.doi.org/10.1109/LEOS.2007.4382491
---------- MLA ----------
Wachulak, P.W., Capeluto, M.G., Patel, D., Marconi, M.C., Menoni, C.S., Rocca, J.J. "Nanopillars and arrays of nanoholes fabricated by extreme ultraviolet interferometric laser lithography" . 20th Annual Meeting of the IEEE Lasers and Electro-Optics Society, LEOS, 2007, pp. 486-487.
http://dx.doi.org/10.1109/LEOS.2007.4382491
---------- VANCOUVER ----------
Wachulak, P.W., Capeluto, M.G., Patel, D., Marconi, M.C., Menoni, C.S., Rocca, J.J. Nanopillars and arrays of nanoholes fabricated by extreme ultraviolet interferometric laser lithography. Conf Proc Laser Electr Optic Soc Annu Meet CLEO. 2007:486-487.
http://dx.doi.org/10.1109/LEOS.2007.4382491