Abstract:
Arrays of holes and pillars were fabricated by multiple exposure interferometric lithography using a table top λ=46.9 nm wavelength laser. Size and the feature characteristic is controlled changing the applied exposure dose. ©2007 IEEE.
Registro:
Documento: |
Conferencia
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Título: | Nanopillars and arrays of nanoholes fabricated by extreme ultraviolet interferometric laser lithography |
Autor: | Wachulak, P.W.; Capeluto, M.G.; Patel, D.; Marconi, M.C.; Menoni, C.S.; Rocca, J.J. |
Ciudad: | Lake Buena Vista, FL |
Filiación: | NSF ERC for Extreme Ultraviolet Science and Technology, Department of Electrical and Computer Engineering, Colorado State University Department o de Fisica, Facultad de Ciencias Exactas, Universidad de Buenos Aires, Argentina
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Palabras clave: | Annual meetings; Electro-optics; Interferometric lithography; Geodetic satellites; Interferometry; Lasers |
Año: | 2007
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Página de inicio: | 486
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Página de fin: | 487
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DOI: |
http://dx.doi.org/10.1109/LEOS.2007.4382491 |
Título revista: | 20th Annual Meeting of the IEEE Lasers and Electro-Optics Society, LEOS
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Título revista abreviado: | Conf Proc Laser Electr Optic Soc Annu Meet CLEO
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ISSN: | 10928081
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CODEN: | CPLSE
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Registro: | https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_10928081_v_n_p486_Wachulak |
Referencias:
- Fernandez, A., Decker, J.Y., Herman, S.M., Philion, D.W., Sweeney, D.W., Perry, M.D., Methods for fabricating arrays of holes using interference lithography (1997) Journal of Vacuum Science and Technology B, 15, pp. 2439-2443
- Solak, H.H., Nanolithography with coherent extreme ultraviolet light (2006) Journal of Physics D, 39, pp. R171-R188
- Solak, H.H., David, C., Gobrecht, J., Golovkina, V., Cerrina, F., Kim, S.O., Nealey, F.P., Sub-50 nm period patterns with EUV interference lithography (2003) Microelectronic Engineering, 67 -8, pp. 56-62
- Macchietto, C.D., Benware, B.R., Rocca, J.J., Generation of millijoule level soft X-ray laser pulses at 4 Hz repetition rate in a highly saturated table top capillary discharge amplifier (1999) Optics Letters, 24, pp. 1115-1117
Citas:
---------- APA ----------
Wachulak, P.W., Capeluto, M.G., Patel, D., Marconi, M.C., Menoni, C.S. & Rocca, J.J.
(2007)
. Nanopillars and arrays of nanoholes fabricated by extreme ultraviolet interferometric laser lithography. 20th Annual Meeting of the IEEE Lasers and Electro-Optics Society, LEOS, 486-487.
http://dx.doi.org/10.1109/LEOS.2007.4382491---------- CHICAGO ----------
Wachulak, P.W., Capeluto, M.G., Patel, D., Marconi, M.C., Menoni, C.S., Rocca, J.J.
"Nanopillars and arrays of nanoholes fabricated by extreme ultraviolet interferometric laser lithography"
. 20th Annual Meeting of the IEEE Lasers and Electro-Optics Society, LEOS
(2007) : 486-487.
http://dx.doi.org/10.1109/LEOS.2007.4382491---------- MLA ----------
Wachulak, P.W., Capeluto, M.G., Patel, D., Marconi, M.C., Menoni, C.S., Rocca, J.J.
"Nanopillars and arrays of nanoholes fabricated by extreme ultraviolet interferometric laser lithography"
. 20th Annual Meeting of the IEEE Lasers and Electro-Optics Society, LEOS, 2007, pp. 486-487.
http://dx.doi.org/10.1109/LEOS.2007.4382491---------- VANCOUVER ----------
Wachulak, P.W., Capeluto, M.G., Patel, D., Marconi, M.C., Menoni, C.S., Rocca, J.J. Nanopillars and arrays of nanoholes fabricated by extreme ultraviolet interferometric laser lithography. Conf Proc Laser Electr Optic Soc Annu Meet CLEO. 2007:486-487.
http://dx.doi.org/10.1109/LEOS.2007.4382491