Artículo
Wachulak, P.W.; Capeluto, M.G.; Marconi, M.C.; Patel, D.; Menoni, C.S.; Rocca, J.J. "Nanoscale patterning in high resolution HSQ photoresist by interferometric lithography with tabletop extreme ultraviolet lasers" (2007) Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 25(6):2094-2097
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Abstract:
Arrays of nanodots and nanoholes were patterned with a highly coherent tabletop 46.9 nm laser on high resolution hydrogen silsesquioxane photoresist using multiple exposure interferometric lithography. The authors observed for λ=46.9 nm radiation a penetration depth in excess of 150 nm. This laser-based extreme ultraviolet interferometric setup allows printing of 0.5×0.5 mm2 areas with different nanoscale patterns using a compact tabletop system and exposure times of tens of seconds. © 2007 American Vacuum Society.
Registro:
| Documento: | Artículo |
| Título: | Nanoscale patterning in high resolution HSQ photoresist by interferometric lithography with tabletop extreme ultraviolet lasers |
| Autor: | Wachulak, P.W.; Capeluto, M.G.; Marconi, M.C.; Patel, D.; Menoni, C.S.; Rocca, J.J. |
| Filiación: | NSF ERC for Extreme Ultraviolet Science and Technology, Department of Electrical and Computer Engineering, Colorado State University, Fort Collins, CO 80523, United States Departamento de Física, Facultad de Ciencias Exactas, Universidad de Buenos Aires, 1428 Buenos Aires, Argentina |
| Palabras clave: | Extreme ultraviolet lasers; Hydrogen silsesquioxane; Interferometric lithography; Nanoscale patterning; High resolution electron microscopy; Interferometry; Photoresists; Ultraviolet radiation; Extreme ultraviolet lithography |
| Año: | 2007 |
| Volumen: | 25 |
| Número: | 6 |
| Página de inicio: | 2094 |
| Página de fin: | 2097 |
| DOI: | http://dx.doi.org/10.1116/1.2801870 |
| Título revista: | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures |
| Título revista abreviado: | J Vac Sci Technol B Microelectron Nanometer Struct |
| ISSN: | 10711023 |
| CODEN: | JVTBD |
| Registro: | https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_10711023_v25_n6_p2094_Wachulak |
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Citas:
---------- APA ----------
Wachulak, P.W., Capeluto, M.G., Marconi, M.C., Patel, D., Menoni, C.S. & Rocca, J.J. (2007) . Nanoscale patterning in high resolution HSQ photoresist by interferometric lithography with tabletop extreme ultraviolet lasers. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 25(6), 2094-2097.http://dx.doi.org/10.1116/1.2801870
---------- CHICAGO ----------
Wachulak, P.W., Capeluto, M.G., Marconi, M.C., Patel, D., Menoni, C.S., Rocca, J.J. "Nanoscale patterning in high resolution HSQ photoresist by interferometric lithography with tabletop extreme ultraviolet lasers" . Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 25, no. 6 (2007) : 2094-2097.http://dx.doi.org/10.1116/1.2801870
---------- MLA ----------
Wachulak, P.W., Capeluto, M.G., Marconi, M.C., Patel, D., Menoni, C.S., Rocca, J.J. "Nanoscale patterning in high resolution HSQ photoresist by interferometric lithography with tabletop extreme ultraviolet lasers" . Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, vol. 25, no. 6, 2007, pp. 2094-2097.http://dx.doi.org/10.1116/1.2801870
---------- VANCOUVER ----------
Wachulak, P.W., Capeluto, M.G., Marconi, M.C., Patel, D., Menoni, C.S., Rocca, J.J. Nanoscale patterning in high resolution HSQ photoresist by interferometric lithography with tabletop extreme ultraviolet lasers. J Vac Sci Technol B Microelectron Nanometer Struct. 2007;25(6):2094-2097.http://dx.doi.org/10.1116/1.2801870
