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Alcaraz, A.N.; Codnia, J.; Azcárate, M.L. "SiF4 IR Photodissociation: Gas phase reactions of SiF3 with CH4" (2009) Journal of Photochemistry and Photobiology A: Chemistry. 205(2-3):79-83
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Abstract:

The infrared multiphoton dissociation (IRMPD) of SiF4 in the presence of CH4 has been studied using a tunable CO2 TEA laser. The siliconated reaction products have been identified. A kinetic scheme has been proposed to explain the experimental results. The reaction rate constant of the trifluorosilyl radical, SiF3, with CH4 has been obtained from the numerical solution of the differential equation system associated to the kinetic mechanism proposed as well as from non-linear regression methods. It has been additionally found that this reaction occurs through two channels. The relative importance of each and their reaction rate constants have been determined as well. © 2009 Elsevier B.V. All rights reserved.

Registro:

Documento: Artículo
Título:SiF4 IR Photodissociation: Gas phase reactions of SiF3 with CH4
Autor:Alcaraz, A.N.; Codnia, J.; Azcárate, M.L.
Filiación:Dpto. Física, Facultad Ingeniería, UBA, Paseo Colón 850, C1063ACV Buenos Aires, Argentina
Centro de Investigaciones en Láseres y Aplicaciones CEILAP (CITEFA-CONICET), Juan Bautista La Salle 4397, Villa Martelli, B1603ALO Buenos Aires, Argentina
Carrera del Investigador CONICET, Argentina
Palabras clave:Infrared multiphoton dissociation; Reaction rate; Silicon tetrafluoride; Trifluorosilyl
Año:2009
Volumen:205
Número:2-3
Página de inicio:79
Página de fin:83
DOI: http://dx.doi.org/10.1016/j.jphotochem.2009.04.009
Título revista:Journal of Photochemistry and Photobiology A: Chemistry
Título revista abreviado:J. Photochem. Photobiol. A Chem.
ISSN:10106030
CODEN:JPPCE
Registro:https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_10106030_v205_n2-3_p79_Alcaraz

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Citas:

---------- APA ----------
Alcaraz, A.N., Codnia, J. & Azcárate, M.L. (2009) . SiF4 IR Photodissociation: Gas phase reactions of SiF3 with CH4. Journal of Photochemistry and Photobiology A: Chemistry, 205(2-3), 79-83.
http://dx.doi.org/10.1016/j.jphotochem.2009.04.009
---------- CHICAGO ----------
Alcaraz, A.N., Codnia, J., Azcárate, M.L. "SiF4 IR Photodissociation: Gas phase reactions of SiF3 with CH4" . Journal of Photochemistry and Photobiology A: Chemistry 205, no. 2-3 (2009) : 79-83.
http://dx.doi.org/10.1016/j.jphotochem.2009.04.009
---------- MLA ----------
Alcaraz, A.N., Codnia, J., Azcárate, M.L. "SiF4 IR Photodissociation: Gas phase reactions of SiF3 with CH4" . Journal of Photochemistry and Photobiology A: Chemistry, vol. 205, no. 2-3, 2009, pp. 79-83.
http://dx.doi.org/10.1016/j.jphotochem.2009.04.009
---------- VANCOUVER ----------
Alcaraz, A.N., Codnia, J., Azcárate, M.L. SiF4 IR Photodissociation: Gas phase reactions of SiF3 with CH4. J. Photochem. Photobiol. A Chem. 2009;205(2-3):79-83.
http://dx.doi.org/10.1016/j.jphotochem.2009.04.009