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Wachulak, P.W.; Patel, D.; Capeluto, M.G.; Menoni, C.S.; Rocca, J.J.; Marconi, M.C. "Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser" (2007) Soft X-Ray Lasers and Applications VII. 6702
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Abstract:

Combining a compact table top soft X ray laser with an interferometric lithography set up arrays of nanodots and nanoholes were directly patterned on the surface of different photoresists. Multiple exposures with a Lloyd's mirror interferometer printed arrays of holes and dots over an area of 0.5× 0.5 mm2 with typical diameters down to 60 nm full width at half maximum. This laser-based soft X-ray interferometric tool demonstrated the possibility to print different nanoscale patterns using a compact table-top set up.

Registro:

Documento: Conferencia
Título:Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser
Autor:Wachulak, P.W.; Patel, D.; Capeluto, M.G.; Menoni, C.S.; Rocca, J.J.; Marconi, M.C.
Ciudad:San Diego, CA
Filiación:NSF ERC for Extreme Ultraviolet Science and Technology, Department of Electrical and Computer Engineering, Colorado State University, United States
Departamento de Física, Facultad de Ciencias Exactas, Universidad de Buenos Aires, Argentina
Palabras clave:Interferometric lithography; Nanopatterning; Soft X-ray lasers; Interferometry; Mirrors; Photoresists; X ray lasers; Interferometric lithography; Nanodots; Nanoholes; Lithography
Año:2007
Volumen:6702
DOI: http://dx.doi.org/10.1117/12.732900
Título revista:Soft X-Ray Lasers and Applications VII
Título revista abreviado:Proc SPIE Int Soc Opt Eng
ISSN:0277786X
CODEN:PSISD
Registro:https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_0277786X_v6702_n_p_Wachulak

Referencias:

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Citas:

---------- APA ----------
Wachulak, P.W., Patel, D., Capeluto, M.G., Menoni, C.S., Rocca, J.J. & Marconi, M.C. (2007) . Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser. Soft X-Ray Lasers and Applications VII, 6702.
http://dx.doi.org/10.1117/12.732900
---------- CHICAGO ----------
Wachulak, P.W., Patel, D., Capeluto, M.G., Menoni, C.S., Rocca, J.J., Marconi, M.C. "Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser" . Soft X-Ray Lasers and Applications VII 6702 (2007).
http://dx.doi.org/10.1117/12.732900
---------- MLA ----------
Wachulak, P.W., Patel, D., Capeluto, M.G., Menoni, C.S., Rocca, J.J., Marconi, M.C. "Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser" . Soft X-Ray Lasers and Applications VII, vol. 6702, 2007.
http://dx.doi.org/10.1117/12.732900
---------- VANCOUVER ----------
Wachulak, P.W., Patel, D., Capeluto, M.G., Menoni, C.S., Rocca, J.J., Marconi, M.C. Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser. Proc SPIE Int Soc Opt Eng. 2007;6702.
http://dx.doi.org/10.1117/12.732900