Conferencia
Iemmi, C.; Moreno, A.; Nicolás, J.; Campos, J. "Correction of aberrations in an optical correlator by using it as a point diffraction interferometer" (2004) Optical Metrology in Production Engineering. 5457:589-597
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Abstract:
In VanderLugt type correlators, the input scene and the filter could be implemented onto twisted liquid crystal displays (LCD's). The modulator used to display the scene and the elements placed before the filter usually introduce phase aberrations. These aberrations have an important influence in the final correlation plane. We propose a new method to evaluate and correct in situ these aberrations by using the correlator as a point diffraction interferometer. In this work, the wave front phase distribution evaluation is performed by means of the phase shift interferometry (PSI) technique. We present the theory on which the method is based and the experimental results obtained by applying it in a convergent correlator.
Registro:
| Documento: | Conferencia |
| Título: | Correction of aberrations in an optical correlator by using it as a point diffraction interferometer |
| Autor: | Iemmi, C.; Moreno, A.; Nicolás, J.; Campos, J. |
| Ciudad: | Strasbourg |
| Filiación: | Departamento de Física, Fac. de Ciencias Exactas y Naturales, Universidad de Buenos Aires, (1428) Buenos Aires, Argentina Departamento de Física, Univ. Autónoma de Barcelona, 08193 Bellaterra, Spain |
| Palabras clave: | Interferometry; Optical Correlators; Phase Measurement; Fourier transforms; Image processing; Interferometers; Light propagation; Liquid crystal displays; Optical filters; Phase measurement; Diffraction interferometers; Optical correlators; Phase contrast microscopes; Phase distribution; Optical systems |
| Año: | 2004 |
| Volumen: | 5457 |
| Página de inicio: | 589 |
| Página de fin: | 597 |
| DOI: | http://dx.doi.org/10.1117/12.545753 |
| Título revista: | Optical Metrology in Production Engineering |
| Título revista abreviado: | Proc SPIE Int Soc Opt Eng |
| ISSN: | 0277786X |
| CODEN: | PSISD |
| Registro: | https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_0277786X_v5457_n_p589_Iemmi |
Referencias:
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Citas:
---------- APA ----------
Iemmi, C., Moreno, A., Nicolás, J. & Campos, J. (2004) . Correction of aberrations in an optical correlator by using it as a point diffraction interferometer. Optical Metrology in Production Engineering, 5457, 589-597.http://dx.doi.org/10.1117/12.545753
---------- CHICAGO ----------
Iemmi, C., Moreno, A., Nicolás, J., Campos, J. "Correction of aberrations in an optical correlator by using it as a point diffraction interferometer" . Optical Metrology in Production Engineering 5457 (2004) : 589-597.http://dx.doi.org/10.1117/12.545753
---------- MLA ----------
Iemmi, C., Moreno, A., Nicolás, J., Campos, J. "Correction of aberrations in an optical correlator by using it as a point diffraction interferometer" . Optical Metrology in Production Engineering, vol. 5457, 2004, pp. 589-597.http://dx.doi.org/10.1117/12.545753
---------- VANCOUVER ----------
Iemmi, C., Moreno, A., Nicolás, J., Campos, J. Correction of aberrations in an optical correlator by using it as a point diffraction interferometer. Proc SPIE Int Soc Opt Eng. 2004;5457:589-597.http://dx.doi.org/10.1117/12.545753
