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Marconi, M.C.; Wachulak, P.W.; Capeluto, M.G.; Vaschenko, G.; Bravo, H.; Menoni, C.S.; Rocca, J.; Anderson, E.H.; Chao, W.; Attwood, D.; Hemberg, O.; Frazer, B.; Bloom, S. "Nanopatterning and nanomachining with table-top extreme ultraviolet lasers" (2006) 2006 MRS Fall Meeting. 961:230-235
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Abstract:

Patterning of photo-resist was accomplished using a table top extreme ultraviolet (EUV) laser and an interferometric lithography set up. The high and controllable degree of coherence output of the recently developed EUV laser in Colorado State University was exploited in a Lloyd's mirror IL setup to pattern lines and arrays of nano-dots with period smaller than 100 nm in a polymethil metacrylate (PMMA) coated Si wafer. Multiple exposure in the same sample added versatility to the patterning method allowing different motifs. Also, using the high peak power of the EUV laser, ablation of sub-100 nm holes in PMMA was also demonstrated. The smallest diameter ablated holes, 82 nm, were obtained by placing the sample at the third order focus of a Fresnell zone plate (FZP) lens. These results demonstrate the feasibility of sub-100 nm patterning of materials with a focused EUV laser beams, opening a path for the development of new nanoprobes and nanomachining tools. © 2007 Materials Research Society.

Registro:

Documento: Conferencia
Título:Nanopatterning and nanomachining with table-top extreme ultraviolet lasers
Autor:Marconi, M.C.; Wachulak, P.W.; Capeluto, M.G.; Vaschenko, G.; Bravo, H.; Menoni, C.S.; Rocca, J.; Anderson, E.H.; Chao, W.; Attwood, D.; Hemberg, O.; Frazer, B.; Bloom, S.
Ciudad:Boston, MA
Filiación:Electrical and Computer Engineering, Colorado State University, 1373 Campus Delivery, Fort Collins, CO 80523, United States
NSF Engineering Research Center for Extreme Ultraviolet Science and Technology, Fort Collins, CO 80523, United States
Departamento de Fisica, Universidad de Buenos Aires, Ciudad Universitaria-Pabellon 1, Buenos Aires, C1428EHA, Argentina
Lawrence Berkeley National Laboratory, Berkeley, CA 94720, United States
University of California at Berkeley, Berkeley, CA 94720, United States
JMAR Technologies Inc., San Diego, CA 92127, United States
Palabras clave:Extreme ultraviolet lasers; Fresnell zone plate (FZP) lens; Extreme ultraviolet lithography; Photoresists; Polymethyl methacrylates; Silicon wafers; Semiconductor quantum dots
Año:2006
Volumen:961
Página de inicio:230
Página de fin:235
Título revista:2006 MRS Fall Meeting
Título revista abreviado:Mater Res Soc Symp Proc
ISSN:02729172
CODEN:MRSPD
Registro:https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_02729172_v961_n_p230_Marconi

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Citas:

---------- APA ----------
Marconi, M.C., Wachulak, P.W., Capeluto, M.G., Vaschenko, G., Bravo, H., Menoni, C.S., Rocca, J.,..., Bloom, S. (2006) . Nanopatterning and nanomachining with table-top extreme ultraviolet lasers. 2006 MRS Fall Meeting, 961, 230-235.
Recuperado de https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_02729172_v961_n_p230_Marconi [ ]
---------- CHICAGO ----------
Marconi, M.C., Wachulak, P.W., Capeluto, M.G., Vaschenko, G., Bravo, H., Menoni, C.S., et al. "Nanopatterning and nanomachining with table-top extreme ultraviolet lasers" . 2006 MRS Fall Meeting 961 (2006) : 230-235.
Recuperado de https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_02729172_v961_n_p230_Marconi [ ]
---------- MLA ----------
Marconi, M.C., Wachulak, P.W., Capeluto, M.G., Vaschenko, G., Bravo, H., Menoni, C.S., et al. "Nanopatterning and nanomachining with table-top extreme ultraviolet lasers" . 2006 MRS Fall Meeting, vol. 961, 2006, pp. 230-235.
Recuperado de https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_02729172_v961_n_p230_Marconi [ ]
---------- VANCOUVER ----------
Marconi, M.C., Wachulak, P.W., Capeluto, M.G., Vaschenko, G., Bravo, H., Menoni, C.S., et al. Nanopatterning and nanomachining with table-top extreme ultraviolet lasers. Mater Res Soc Symp Proc. 2006;961:230-235.
Available from: https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_02729172_v961_n_p230_Marconi [ ]