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Capeluto, M.G.; Wachulak, P.; Marconi, M.C.; Patel, D.; Menoni, C.S.; Rocca, J.J.; Iemmi, C.; Anderson, E.H.; Chao, W.; Attwood, D.T. "Table top nanopatterning with extreme ultraviolet laser illumination" (2007) Microelectronic Engineering. 84(5-8):721-724
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Abstract:

Patterning with extreme ultraviolet light generated by a compact, bright laser source operating at a wavelength of 46.9 nm is demonstrated using two complementary approaches: multiple beam interferometric lithography and de-magnifying projection. Features with sizes ranging from 370 nm to 60 nm were printed in a few seconds in poly-methyl methacrylate resist. These proof-of-principle experiments demonstrate practical table-top nanopatterning tools based on extreme ultraviolet lasers for nanotechnology applications. © 2007 Elsevier B.V. All rights reserved.

Registro:

Documento: Artículo
Título:Table top nanopatterning with extreme ultraviolet laser illumination
Autor:Capeluto, M.G.; Wachulak, P.; Marconi, M.C.; Patel, D.; Menoni, C.S.; Rocca, J.J.; Iemmi, C.; Anderson, E.H.; Chao, W.; Attwood, D.T.
Filiación:NSF Engineering Research Center for Extreme Ultraviolet Science and Technology, Colorado State University, Fort Collins, CO 80523, United States
Department of Electrical and Computer Engineering, Colorado State University, Fort Collins, CO 80523, United States
Departamento de Fisica, Facultad de Ciencias Exactas y Naturales, Ciudad Universitaria, Buenos Aires, C1428EHA, Argentina
Center of X-Ray Optics, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, United States
University of California at Berkeley, Berkeley, CA 94720, United States
Palabras clave:EUV lasers; Interferometric lithography; Nanopatterning; Table top photolithography; Laser interferometry; Lithography; Nanotechnology; Polymethyl methacrylates; Ultraviolet radiation; Wavelength; EUV lasers; Interferometric lithography; Nanopatterning; Table top photolithography; Lasers
Año:2007
Volumen:84
Número:5-8
Página de inicio:721
Página de fin:724
DOI: http://dx.doi.org/10.1016/j.mee.2007.01.018
Título revista:Microelectronic Engineering
Título revista abreviado:Microelectron Eng
ISSN:01679317
CODEN:MIENE
Registro:https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_01679317_v84_n5-8_p721_Capeluto

Referencias:

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Citas:

---------- APA ----------
Capeluto, M.G., Wachulak, P., Marconi, M.C., Patel, D., Menoni, C.S., Rocca, J.J., Iemmi, C.,..., Attwood, D.T. (2007) . Table top nanopatterning with extreme ultraviolet laser illumination. Microelectronic Engineering, 84(5-8), 721-724.
http://dx.doi.org/10.1016/j.mee.2007.01.018
---------- CHICAGO ----------
Capeluto, M.G., Wachulak, P., Marconi, M.C., Patel, D., Menoni, C.S., Rocca, J.J., et al. "Table top nanopatterning with extreme ultraviolet laser illumination" . Microelectronic Engineering 84, no. 5-8 (2007) : 721-724.
http://dx.doi.org/10.1016/j.mee.2007.01.018
---------- MLA ----------
Capeluto, M.G., Wachulak, P., Marconi, M.C., Patel, D., Menoni, C.S., Rocca, J.J., et al. "Table top nanopatterning with extreme ultraviolet laser illumination" . Microelectronic Engineering, vol. 84, no. 5-8, 2007, pp. 721-724.
http://dx.doi.org/10.1016/j.mee.2007.01.018
---------- VANCOUVER ----------
Capeluto, M.G., Wachulak, P., Marconi, M.C., Patel, D., Menoni, C.S., Rocca, J.J., et al. Table top nanopatterning with extreme ultraviolet laser illumination. Microelectron Eng. 2007;84(5-8):721-724.
http://dx.doi.org/10.1016/j.mee.2007.01.018