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Abstract:

A simple semiempirical model of the electron beam generated by a pulsed cold cathode electron gun has been developed. The model describes analytically the observed self-focusing of the discharge and predicts the dynamical variation of the focal distance, in good agreement with experiments. This effect plays a major role in the determination of the effective duration of the energy pulse. The model was used to conduct simple calculations of energy thresholds for melting of solid materials, giving helpful insight on ranges of operation of this kind of electron gun for its application to material processing. A comparison with available experimental data for Mg70Zn30 samples is given. © 1997 IEEE.

Registro:

Documento: Artículo
Título:A simple model of a glow discharge electron beam for materials processing
Autor:Etcheverry, J.I.; Mingolo, N.; Rocca, J.J.; Martínez, O.E.
Filiación:Departamento de Matemâtica, Facultad de Ciencias Exactas Y Naturales, Universidad de Buenos Aires, 1428 Buenos Aires, Argentina
Palabras clave:Cathodes; Electron guns; Glow discharges; Models; Focal distance; Glow discharge electron beam; Materials processing; Electron beams
Año:1997
Volumen:25
Número:3
Página de inicio:427
Página de fin:432
DOI: http://dx.doi.org/10.1109/27.597256
Título revista:IEEE Transactions on Plasma Science
Título revista abreviado:IEEE Trans Plasma Sci
ISSN:00933813
CODEN:ITPSB
Registro:https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_00933813_v25_n3_p427_Etcheverry

Referencias:

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  • Ranea-Sandoval, H.F., N. Reesor, B. T. Szapiro, C. Murray, and J. J. Rocca, "Study of Intense Electron Beams Produced by High-voltage Pulsed Glow Discharges," IEEE Trans. Plasma Sci., Vol. PS, , 15, pp. 361-374, Aug. 1987
  • Christiansen, J., Schultheiss, C., "Production of High Current Particle Beams by Low Pressure Spark Discharges," Z. Phys., Vol a, , 290, p. 35, 1979; also see, W. Benker, J. Christiansen, K. Frank, H. Gundel, and W. Hartmann étal., "Generation of intense pulsed electron beams by the pseudospark discharge," IEEE Trans. Plasma Sci., vol 17, pp. 754-757, 1989
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  • Moore, C.A., J. J. Rocca, G. J. Collins, P. E. Russell, and J. D. Geller, "Titanium Disilicate Formation by Wide Area Electron Beam Irradiation," Appl. Phys. Lett., Vol., , 45, pp. 169-171, 1984
  • Lanno, N.J., J. T. Vedeyen, S. S. Chan, and B. G. Streetman, "Plasma Annealing of Ion Implanted Semiconductors," Appl. Phys. Lett., Vol., , 39, pp. 622-625, 1981
  • Moore, C.A., J. J. Rocca, T. Johnson, G. J. Collins, P. E. Russell, "Large Area Electron Beam Annealing," Appl. Phys. Lett., Vol., , 43, pp. 290-292, 1983
  • Bishop, D.C., K. A. Emery, J. J. Rocca, L. R. Thompson, H. Zarnani, G. J. Collins, "Silicon Nitride Films Deposited with an Electron Beam Created Plasma," Appl. Phys. Lett., Vol., , 44, pp. 598-600, 1984
  • Thompson, L.R., J. J. Rocca, P. K. Boyer, K. Emery, and G. J. Collins, "Electron Beam Assisted Chemical Vapor Deposition of SiO," Appl. Phys. Lett., Vol., , 43, pp. 777-779, 1983
  • Hobel, M., J. Geek, G. Linker, and C. Schultheiss, "Deposition of Superconductin YBACuO Thin Films by Pseudospark Ablation," Appl. Phys. Lett., Vol, , 56, pp. 973-975, 1990
  • Kobashi, K., S. Miyauchi, K. Miyata, K. Nishimura, and J. J. Rocca, "Etching of Polycrystalline Diamond Films by Electron Beam Assisted Plasma," J. Mater. Res., to Be Published.
  • Mingolo, N., And J. J. Rocca, "Production of Amorphous Metallic Surfaces by means of a Pulsed Glow Discharge Electron Beam," J. Mater. Res., Vol., , 7, no 5, pp. 1096-1099, 1992
  • Lee, S.A., U. A. Andersen, J. J. Rocca, M. Marconi, and N. D. Reesor, "Electric Field Distribution in the Cathode Sheath of an Electron Beam Glow Discharge," Appl. Phys. Lett., Vol., , 51, no. 6, pp. 409-411, 1987
  • Etcheverry, J.I., Marti'Nez, O.E., "Monte Carlo Calculation of the KeV Electron Energy Dissipation Curves in Compound Materials," Ann. Argentine Chem. Soc., to Be Published.
  • Etcheverry, J.I., "Numerical Simulation of a Laser Melting and Vaporization Problem," Ann. Argentine Phys. Soc., Vol., , 5, pp. 220-223, 1993

Citas:

---------- APA ----------
Etcheverry, J.I., Mingolo, N., Rocca, J.J. & Martínez, O.E. (1997) . A simple model of a glow discharge electron beam for materials processing. IEEE Transactions on Plasma Science, 25(3), 427-432.
http://dx.doi.org/10.1109/27.597256
---------- CHICAGO ----------
Etcheverry, J.I., Mingolo, N., Rocca, J.J., Martínez, O.E. "A simple model of a glow discharge electron beam for materials processing" . IEEE Transactions on Plasma Science 25, no. 3 (1997) : 427-432.
http://dx.doi.org/10.1109/27.597256
---------- MLA ----------
Etcheverry, J.I., Mingolo, N., Rocca, J.J., Martínez, O.E. "A simple model of a glow discharge electron beam for materials processing" . IEEE Transactions on Plasma Science, vol. 25, no. 3, 1997, pp. 427-432.
http://dx.doi.org/10.1109/27.597256
---------- VANCOUVER ----------
Etcheverry, J.I., Mingolo, N., Rocca, J.J., Martínez, O.E. A simple model of a glow discharge electron beam for materials processing. IEEE Trans Plasma Sci. 1997;25(3):427-432.
http://dx.doi.org/10.1109/27.597256