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Abstract:

Polycrystalline titanium thin films have been widely employed as interlayer between the substrate and different coatings in order to improve adhesion strength, corrosion resistance and wear performance, as well as to promote the growth of crystalline phases of the coating. The thickness of the Ti layer can be relevant on the behavior of the coatings, however very few studies have been carried out. In this work, the crystal structure of polycrystalline titanium films deposited with a vacuum arc discharge on monocrystalline silicon wafers (100) was studied and a dependence on the film thickness was found. The presence of the fcc phase of titanium was observed for the thinnest films with a critical thickness estimated in 300 nm, a much larger value than those reported for other deposition processes. For larger thicknesses, the films grew as α-titanium with a preferred orientation in the [100] direction. The obtained results agreed with a growth model based on the matching between the film and the substrate lattice. The characteristics of the films deposited in two steps, which had not been previously investigated, reinforced the suggested model. © 2015 Elsevier B.V.

Registro:

Documento: Artículo
Título:Study of the structure of titanium thin films deposited with a vacuum arc as a function of the thickness
Autor:Fazio, M.; Vega, D.; Kleiman, A.; Colombo, D.; Franco Arias, L.M.; Márquez, A.
Filiación:Instituto de Física del Plasma, CONICET, Departamento de Física, Facultad de Ciencias Exactas y Naturales, Universidad de Buenos Aires, Cdad. Universitaria Pab. 1Buenos Aires 1428, Argentina
Departamento Física de la Materia Condensada, Gerencia de Investigación y Aplicaciones, Comisión Nacional de Energía Atómica, Av. Gral Paz, San Martín, Buenos Aires 1499, Argentina
División Metalurgia, INTEMA, CONICET, UNMdP, Av. J. B. Justo 4302, Mar del Plata, B7608FDQ, Argentina
Palabras clave:Face centered cubic titanium phase; Films; Thin films; Titanium; Vacuum arc discharge; Coatings; Corrosion resistance; Crystal structure; Film growth; Films; Hardening; Monocrystalline silicon; Silicon wafers; Titanium; Vacuum applications; Vacuum technology; Wear resistance; Critical thickness; Crystalline phasis; Deposition process; Face-centered cubic; Polycrystalline titanium; Preferred orientations; Titanium thin films; Vacuum arc discharges; Thin films
Año:2015
Volumen:593
Página de inicio:110
Página de fin:115
DOI: http://dx.doi.org/10.1016/j.tsf.2015.09.015
Título revista:Thin Solid Films
Título revista abreviado:Thin Solid Films
ISSN:00406090
CODEN:THSFA
Registro:https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_00406090_v593_n_p110_Fazio

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Citas:

---------- APA ----------
Fazio, M., Vega, D., Kleiman, A., Colombo, D., Franco Arias, L.M. & Márquez, A. (2015) . Study of the structure of titanium thin films deposited with a vacuum arc as a function of the thickness. Thin Solid Films, 593, 110-115.
http://dx.doi.org/10.1016/j.tsf.2015.09.015
---------- CHICAGO ----------
Fazio, M., Vega, D., Kleiman, A., Colombo, D., Franco Arias, L.M., Márquez, A. "Study of the structure of titanium thin films deposited with a vacuum arc as a function of the thickness" . Thin Solid Films 593 (2015) : 110-115.
http://dx.doi.org/10.1016/j.tsf.2015.09.015
---------- MLA ----------
Fazio, M., Vega, D., Kleiman, A., Colombo, D., Franco Arias, L.M., Márquez, A. "Study of the structure of titanium thin films deposited with a vacuum arc as a function of the thickness" . Thin Solid Films, vol. 593, 2015, pp. 110-115.
http://dx.doi.org/10.1016/j.tsf.2015.09.015
---------- VANCOUVER ----------
Fazio, M., Vega, D., Kleiman, A., Colombo, D., Franco Arias, L.M., Márquez, A. Study of the structure of titanium thin films deposited with a vacuum arc as a function of the thickness. Thin Solid Films. 2015;593:110-115.
http://dx.doi.org/10.1016/j.tsf.2015.09.015