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Domené, E.A.; Schiltz, D.; Patel, D.; Day, T.; Jankowska, E.; Martínez, O.E.; Rocca, J.J.; Menoni, C.S. "Thin film absorption characterization by focus error thermal lensing" (2017) Review of Scientific Instruments. 88(12)
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Abstract:

A simple, highly sensitive technique for measuring absorbed power in thin film dielectrics based on thermal lensing is demonstrated. Absorption of an amplitude modulated or pulsed incident pump beam by a thin film acts as a heat source that induces thermal lensing in the substrate. A second continuous wave collimated probe beam defocuses after passing through the sample. Determination of absorption is achieved by quantifying the change of the probe beam profile at the focal plane using a four-quadrant detector and cylindrical lenses to generate a focus error signal. This signal is inherently insensitive to deflection, which removes noise contribution from point beam stability. A linear dependence of the focus error signal on the absorbed power is shown for a dynamic range of over 105. This technique was used to measure absorption loss in dielectric thin films deposited on fused silica substrates. In pulsed configuration, a single shot sensitivity of about 20 ppm is demonstrated, providing a unique technique for the characterization of moving targets as found in thin film growth instrumentation. © 2017 Author(s).

Registro:

Documento: Artículo
Título:Thin film absorption characterization by focus error thermal lensing
Autor:Domené, E.A.; Schiltz, D.; Patel, D.; Day, T.; Jankowska, E.; Martínez, O.E.; Rocca, J.J.; Menoni, C.S.
Filiación:Laboratorio de Fotónica, Departamento de Física, UBA, Paseo Colón Av. Paseo Colón 850, Buenos Aires, C1063ACV, Argentina
Consejo Nacional de Investigaciones Científicas y Técnicas (CONICET), Godoy Cruz 2290, Buenos Aires, C1425FQB, Argentina
Department of Electrical and Computer Engineering, Colorado State University, Fort Collins, CO 80523, United States
Palabras clave:Dielectric materials; Errors; Film growth; Fused silica; Optical pumping; Probes; Silica; Substrates; Amplitude modulated; Dielectric thin films; Focus error signal; Four quadrant detectors; Fused silica substrates; Noise contributions; Sensitive techniques; Thin-film dielectrics; Thin films
Año:2017
Volumen:88
Número:12
DOI: http://dx.doi.org/10.1063/1.5012915
Título revista:Review of Scientific Instruments
Título revista abreviado:Rev. Sci. Instrum.
ISSN:00346748
CODEN:RSINA
Registro:https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_00346748_v88_n12_p_Domene

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Citas:

---------- APA ----------
Domené, E.A., Schiltz, D., Patel, D., Day, T., Jankowska, E., Martínez, O.E., Rocca, J.J.,..., Menoni, C.S. (2017) . Thin film absorption characterization by focus error thermal lensing. Review of Scientific Instruments, 88(12).
http://dx.doi.org/10.1063/1.5012915
---------- CHICAGO ----------
Domené, E.A., Schiltz, D., Patel, D., Day, T., Jankowska, E., Martínez, O.E., et al. "Thin film absorption characterization by focus error thermal lensing" . Review of Scientific Instruments 88, no. 12 (2017).
http://dx.doi.org/10.1063/1.5012915
---------- MLA ----------
Domené, E.A., Schiltz, D., Patel, D., Day, T., Jankowska, E., Martínez, O.E., et al. "Thin film absorption characterization by focus error thermal lensing" . Review of Scientific Instruments, vol. 88, no. 12, 2017.
http://dx.doi.org/10.1063/1.5012915
---------- VANCOUVER ----------
Domené, E.A., Schiltz, D., Patel, D., Day, T., Jankowska, E., Martínez, O.E., et al. Thin film absorption characterization by focus error thermal lensing. Rev. Sci. Instrum. 2017;88(12).
http://dx.doi.org/10.1063/1.5012915