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Bhuyan, H.; Favre, M.; Valderrama, E.; Henriquez, A.; Vogel, G.; Chuaqui, H.; Wyndham, E.; Cabrera, A.; Ramos-Moore, E.; Ñez, P.A.; Kelly, H.; Grondona, D.; Goyanes, S. "High energy ion beam irradiation on titanium substrate in a pulsed plasma device operating with methane" (2009) Journal of Physics D: Applied Physics. 42(20)
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Abstract:

We report the investigation of high energy ion beam irradiation on titanium (Ti) substrates at room temperature using a low energy plasma focus (PF) device operating in methane gas. The surface modifications induced by the ion beam using two different anode materials, graphite and copper, are characterized using standard surface science diagnostic tools, such as x-ray diffraction, scanning electron microscopy, energy-dispersive x-ray analysis, Raman spectroscopy and Auger electron spectroscopy. It has been found that the interaction of the pulsed PF ion beams, with characteristic energy in the 15-300 keV range, with the Ti surface, results in the formation of nanocomposite carbon structures. It is observed that the resulting ion irradiated surface morphologies are different, depending on the different anode materials, under otherwise identical operational conditions. In the case of the graphite anode the interaction of PF ion beams followed by the anode vapour with the Ti surface results in the formation of gradient layers of TiC with embedded carbon nanostructures. © 2009 IOP Publishing Ltd.

Registro:

Documento: Artículo
Título:High energy ion beam irradiation on titanium substrate in a pulsed plasma device operating with methane
Autor:Bhuyan, H.; Favre, M.; Valderrama, E.; Henriquez, A.; Vogel, G.; Chuaqui, H.; Wyndham, E.; Cabrera, A.; Ramos-Moore, E.; Ñez, P.A.; Kelly, H.; Grondona, D.; Goyanes, S.
Filiación:Departamento de Física, Pontificia Universidad Católica de Chile, Casilla 306, Santiago 22, Chile
Departamento de Física, Facultad de Ciencias Exactas y Naturales, Ciudad Universitaria, Pabellon 1, 1428 Buenos Aires, Argentina
Palabras clave:Anode material; Carbon Nanostructures; Carbon structures; Characteristic energy; Diagnostic tools; Gradient layers; Graphite anode; High energy; Ion beam irradiation; Irradiated surface; Low-energy plasma; Methane gas; Operational conditions; Pulsed plasma; Room temperature; Surface modification; Surface science; Titanium substrates; Anodes; Beam plasma interactions; Chemical modification; Graphite; Ion beams; Ion bombardment; Ions; Methane; Plasma devices; Raman spectroscopy; Scanning electron microscopy; Substrates; Surface treatment; Titanium; Titanium carbide; X ray diffraction analysis; Auger electron spectroscopy
Año:2009
Volumen:42
Número:20
DOI: http://dx.doi.org/10.1088/0022-3727/42/20/205207
Título revista:Journal of Physics D: Applied Physics
Título revista abreviado:J Phys D
ISSN:00223727
CODEN:JPAPB
Registro:https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_00223727_v42_n20_p_Bhuyan

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Citas:

---------- APA ----------
Bhuyan, H., Favre, M., Valderrama, E., Henriquez, A., Vogel, G., Chuaqui, H., Wyndham, E.,..., Goyanes, S. (2009) . High energy ion beam irradiation on titanium substrate in a pulsed plasma device operating with methane. Journal of Physics D: Applied Physics, 42(20).
http://dx.doi.org/10.1088/0022-3727/42/20/205207
---------- CHICAGO ----------
Bhuyan, H., Favre, M., Valderrama, E., Henriquez, A., Vogel, G., Chuaqui, H., et al. "High energy ion beam irradiation on titanium substrate in a pulsed plasma device operating with methane" . Journal of Physics D: Applied Physics 42, no. 20 (2009).
http://dx.doi.org/10.1088/0022-3727/42/20/205207
---------- MLA ----------
Bhuyan, H., Favre, M., Valderrama, E., Henriquez, A., Vogel, G., Chuaqui, H., et al. "High energy ion beam irradiation on titanium substrate in a pulsed plasma device operating with methane" . Journal of Physics D: Applied Physics, vol. 42, no. 20, 2009.
http://dx.doi.org/10.1088/0022-3727/42/20/205207
---------- VANCOUVER ----------
Bhuyan, H., Favre, M., Valderrama, E., Henriquez, A., Vogel, G., Chuaqui, H., et al. High energy ion beam irradiation on titanium substrate in a pulsed plasma device operating with methane. J Phys D. 2009;42(20).
http://dx.doi.org/10.1088/0022-3727/42/20/205207