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Abstract:

A numerical study of the application of a pulsed cold cathode electron gun to materials processing is performed. A simple semiempirical model of the discharge is used, together with backscattering and energy deposition profiles obtained by a Monte Carlo technique, in order to evaluate the energy source term inside the material. The numerical computation of the heat equation with the calculated source term is performed in order to obtain useful information on melting and vaporization thresholds, melted radius and depth, and on the dependence of these variables on processing parameters such as operating pressure, initial voltage of the discharge and cathode-sample distance. Numerical results for stainless steel are presented, which demonstrate the need for several modifications of the experimental design in order to achieve a better efficiency. © 1998 American Institute of Physics.

Registro:

Documento: Artículo
Título:Numerical modeling of materials processing applications of a pulsed cold cathode electron gun
Autor:Etcheverry, J.I.; Martínez, O.E.; Mingolo, N.
Filiación:Departmento de Matemática, Universidad de Buenos Aires, Ciudad Universitaria, 1428 Buenos Aires, Argentina
Departmento de Física, Universidad de Buenos Aires, Ciudad Universitaria, 1428 Buenos Aires, Argentina
Departmento de Física, Facultad de Ingeniería, Universidad de Buenos Aires, Paseo Colón 850, 1063 Buenos Aires, Argentina
Año:1998
Volumen:83
Número:7
Página de inicio:3856
Página de fin:3864
DOI: http://dx.doi.org/10.1063/1.366617
Título revista:Journal of Applied Physics
Título revista abreviado:J Appl Phys
ISSN:00218979
CODEN:JAPIA
Registro:https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_00218979_v83_n7_p3856_Etcheverry

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Citas:

---------- APA ----------
Etcheverry, J.I., Martínez, O.E. & Mingolo, N. (1998) . Numerical modeling of materials processing applications of a pulsed cold cathode electron gun. Journal of Applied Physics, 83(7), 3856-3864.
http://dx.doi.org/10.1063/1.366617
---------- CHICAGO ----------
Etcheverry, J.I., Martínez, O.E., Mingolo, N. "Numerical modeling of materials processing applications of a pulsed cold cathode electron gun" . Journal of Applied Physics 83, no. 7 (1998) : 3856-3864.
http://dx.doi.org/10.1063/1.366617
---------- MLA ----------
Etcheverry, J.I., Martínez, O.E., Mingolo, N. "Numerical modeling of materials processing applications of a pulsed cold cathode electron gun" . Journal of Applied Physics, vol. 83, no. 7, 1998, pp. 3856-3864.
http://dx.doi.org/10.1063/1.366617
---------- VANCOUVER ----------
Etcheverry, J.I., Martínez, O.E., Mingolo, N. Numerical modeling of materials processing applications of a pulsed cold cathode electron gun. J Appl Phys. 1998;83(7):3856-3864.
http://dx.doi.org/10.1063/1.366617